Scanning exposure apparatus and method with run-up distance control

Abstract

A method is provided for transferring a mask pattern on a mask onto each of a plurality of shot areas on a substrate by synchronously moving the mask and the substrate with respect to an exposing radiation flux. The method includes the steps of optimizing run-up distances of the mask and the substrate with respect to each of the plurality of shot areas, determining respective acceleration starting positions for the mask and the substrate for the shot area to be exposed in accordance with the corresponding run-up distances optimized in the step of optimizing, and accelerating the mask and the substrate from the respective acceleration starting positions to respective scanning speeds. The method further includes the steps of maintaining the respective scanning speeds of the mask and the substrate to synchronously move the mask and the photosensitive substrate, and directing the exposing radiation flux towards the mask to project the image of the mask pattern onto the shot area when the mask and the substrate complete respective run-up distances in the step of maintaining.

Dependencies are inferred from the claim text.