Exposure apparatus, imaging performance measurement method, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method
AssigneeCanon Kabushiki Kaisha
InventorYoshinori Ohsaki
Life of this patent
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Abstract
An exposure apparatus for projecting and exposing through a projection optical system a transfer pattern formed on a master onto a substrate placed on a movable stage. The apparatus includes a mark placed on the movable stage and imparting a phase difference to incident light, based on an incident position, and then outputting the light, an image reception section, wherein the mark is imaged on the image reception section, using light of an exposure wavelength through the projection optical system, and a data processing section for calculating an imaging performance of the projection optical system on the basis of image data obtained by the image reception section.
Claims26
An exposure apparatus for projecting and exposing through a projection optical system a transfer pattern formed on a master onto a substrate placed on a movable stage, said apparatus comprising:
- a mark placed on the movable stage and imparting a phase difference to incident light, based on an incident position, and then outputting the light;
- an image reception section, wherein said mark is imaged on said image reception section, using light of an exposure wavelength through the projection optical system;
- and
- a data processing section for calculating an imaging performance of the projection optical system on the basis of image data obtained by said image reception section.
A method of measuring imaging performance of a projection optical system, said method comprising the steps of:
- locating a mark planed near an image surface of the projection optical system, the mark imparting a phase difference to incident light, based on an incident position, and then outputting the light;
- sensing an image of the mark by an image sensing element through the projection optical system by using light with a wavelength used in the projection optical system;
- and
- calculating the imaging performance of the projection optical system from the sensed image data.
A device manufacturing method comprising the steps of:
- installing in semiconductor manufacturing factory manufacturing apparatuses, for performing various processes, including an exposure apparatus for projecting and exposing through a projection optical system a transfer pattern formed on a master onto a substrate placed on a movable stage, the exposure apparatus comprising a mark imparting a phase difference to incident light, based on an incident position, and then outputting the light, an image reception section for imaging the mark on an image sensing element at an exposure wavelength through the projection optical system, and a data processing section for calculating an imaging performance of the projection optical system on the basis of image data obtained by the image reception section;
- and
- manufacturing a semiconductor device by performing a plurality of processes using the manufacturing apparatuses.
A semiconductor manufacturing factory comprising:
- manufacturing apparatuses, for performing various processes, including an exposure apparatus for projecting and exposing through a projection optical system a transfer pattern formed on a master onto a substrate placed on a movable stage, the exposure apparatus comprising a mark imparting a phase difference to incident light, based on an incident position, and then outputting the light, an image reception section for imaging the mark on an image sensing element at an exposure wavelength through the projection optical system, and a data processing section for calculating an imaging performance of the projection optical system on the basis of image data obtained by the image reception section;
- a local area network for connecting the manufacturing apparatuses;
- and
- a gateway for allowing access to an external network outside the factory from the local area network,
- wherein data information about at least one of the manufacturing apparatuses is communicated.
A maintenance method for an exposure apparatus installed in a semiconductor manufacturing factory to project and expose through a projection optical system a transfer pattern formed on a master onto a substrate placed on a movable stage, the exposure apparatus comprising a mark imparting a phase difference to incident light, based on an incident position, and then outputting the light, an image reception section for imaging the mark on an image sensing element at an exposure wavelength through the projection optical system, and a data processing section for calculating an imaging performance of the projection optical system on the basis of image data obtained by the image reception section, said method comprising the steps of:
- making a vendor or user of the exposure apparatus provide a maintenance database connected to an external network outside the semiconductor manufacturing factory;
- allowing access to the maintenance database from the semiconductor manufacturing factory via the external network;
- and
- transmitting maintenance information accumulated in the maintenance database to the semiconductor manufacturing factory via the external network.
An exposure apparatus for projecting and exposing through a projection optical system a transfer pattern formed on a master onto a substrate placed on a movable stage, the exposure apparatus including a mark imparting a phase difference to incident light, based on an incident position, and then outputting the light, an image reception section for imaging said mark on an image sensing element at an exposure wavelength through the projection optical system, and a data processing section for calculating an imaging performance of the projection optical system on the basis of image data obtained by said image reception section, said apparatus comprising:
- a display;
- a network interface;
- and
- a computer for executing network software,
- wherein maintenance information of the exposure apparatus is communicated via a computer network.
Dependencies are inferred from the claim text.