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US 6,645,696 B1Granted
Photoimageable composition
AssigneeEuv LLC
InventorsKelby Liv Simison, Paul Dentinger
Life of this patent
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AssigneeEuv LLC
InventorsKelby Liv Simison, Paul Dentinger
Estimating the term…
The use of selected buffering amines in a photoimageable composition prevents process bias which with conventional photoresists causes designed features to be distorted, especially in corners and high resolution features. It is believed that the amines react with the catalysts, e.g., photoacids, generated to create an inert salt. The presence of the amines also increases resolution. Suitable photoimageable compositions includes: (a) a multifunctional polymeric epoxy resin that is dissolved in an organic solvent wherein the epoxy resin comprises oligomers of bisphenol A that is quantitatively protected by glycidyl ether and wherein the oligomers have an average functionality that ranges from about 3 to 12; (b) a photoactive compound; and (c) an amine that is selected from the group consisting of triisobutylamine, 1,8-bis(dimethylamino)naphthalene (also known as PROTON SPONGET™), 2,2′-diazabicyclo[2.2.2] octane and mixtures thereof. The photoimageable composition is particularly suited for producing high aspect ratio metal microstructures.
A photoimageable composition comprising:
A method of fabricating microstructures that comprises the steps of:
A method of fabricating a metal structure that comprises the steps of:
Dependencies are inferred from the claim text.