Universal backplane assembly and methods
AssigneeTokyo Electron Limited
InventorsDoug Caldwell, Albert Garcia, Jr., Thomas J. Horback, Michael James Lombardi, Mark McNicholas, Dean Mize, Gon Wang
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AssigneeTokyo Electron Limited
InventorsDoug Caldwell, Albert Garcia, Jr., Thomas J. Horback, Michael James Lombardi, Mark McNicholas, Dean Mize, Gon Wang
Estimating the term…
A backplane assembly for a substrate processing system that is selectively configurable to provide an effective thermal contact with substrates of differing sizes. The backplane assembly includes a backplane base installed in a vacuum chamber of the substrate processing system and plural faceplates which are removably mountable to the backplane base. The backplane assembly is operable for regulating the temperature of the substrate and include elements that promote the efficient transfer of heat between the backplane base and the faceplate to perform the temperature regulation during processing. Each of the faceplates has a contact surface dimensioned and configured to engage a correspondingly dimensioned and/or configured type of substrate. The faceplates are readily demountable from the backplane base for exchange to accommodate a change in the dimension and/or configuration of the substrates being processed by the substrate processing system without removing the backplane base from the vacuum chamber.
A backplane assembly for processing substrates of different configurations and/or dimensions on a sequential basis in a substrate processing system incorporating a ventable vacuum chamber with an access port, comprising:
A substrate processing system for processing substrates of different configurations and/or dimensions on a sequential basis, comprising:
Dependencies are inferred from the claim text.