System and method for controlling a vapor dryer process
AssigneeTexas Instruments Incorporated
InventorsNeal T. Murphy, Claire Ching-Shan Jung, Daryl R. Koehl, Donald J. Rigsby
Life of this patent
Estimating the term…
Abstract
A system and method are disclosed including a vapor dryer chamber (12) with a lid (14). A heater (16) is disposed within the vapor dryer chamber to vaporize liquid drying medium (24), preferably isopropyl alcohol, in the bottom of the vapor dryer chamber (12). Cooling coils (18) disposed within an upper portion of the vapor drying chamber (12) condense the drying medium vapor. A vapor monitor assembly (30) is disposed within the vapor dryer chamber (12) to monitor the vapor concentration within vapor dryer chamber (12). A controller (40) is associated with the vapor monitor assembly (30) and evaluates vapor concentration measurements from the vapor monitor (38).
Claims8
A method for monitoring a vapor drying process during semiconductor fabrication comprising:
- providing a vapor monitor in a vapor dryer chamber;
- measuring vapor concentration at a selected level of the vapor dryer chamber;
- recording the vapor concentration measurement;
- and
- controlling the vapor drying process using the vapor concentration measurement.
Dependencies are inferred from the claim text.