System for uniformly heating photoresist

A system, comprising;

• a bakeplate;
• a plurality of lamps;
• a plurality of optical fibers configured to direct radiation to various portions of the bakeplate;
• a lamp driving system configured to drive the lamps;
• a measuring system configured to measure a parameter indicative of temperature at a plurality of locations on the bakeplate;
• and
• a processor operatively coupled to the measuring system and the lamp driving system, the processor being capable of receiving data from the measuring system and controlling, at least partially based on such data, the lamp driving system so as to regulate temperature at the plurality of locations.

A method for regulating coating temperature, comprising:

• placing a wafer coated with a coating on top of a bakeplate;
• heating a plurality of portions of the bake plate with a plurality of heating lamps;
• directing radiation to the plurality of portions of the bakeplate via optical fibers:
• measuring via reflected radiation a parameter indicative of the coating temperature at a plurality of locations on the coating;
• and
• controlling heating of bakeplate portions, independently of heating of other bakeplate portions, to regulate coating temperature at each of the plurality of locations.

A method for regulating coating temperature, comprising:

• placing a coated wafer on top of a bakeplate;
• heating a plurality of portions of the bake plate with a plurality of heating lamps;
• directing radiation to the plurality of portions of the bakeplate via optical fibers;
• measuring via reflected radiation a parameter indicative of bakeplate temperature at a plurality of locations on the bakeplate;
• and
• controlling heating of each of the bakeplate portions, independently of heating of bakeplate portions to regulate bakeplate temperature at each of the corresponding plurality of locations.

A system for regulating temperature of a photoresist coating a wafer supported by a bakeplate, comprising:

• means for monitoring temperature of portions of the photoresist corresponding to portions of the bakeplate;
• and
• means for directing radiation to portions of the bakeplate via optical fibers:
• and
• means for selectively heating a plurality of the portions of the bakeplate with a plurality of lamps so as to regulate temperature of the photoresist.

A system for regulating temperature of a photoresist coating a wafer supported by a bakeplate, comprising:

• a temperature measuring system for measuring temperature of various portions of the photoresist;
• a temperature measuring system for measuring temperature of the bake plate by directing radiation thereupon via optical fibers;
• a system for mapping the photoresist portions with portions of the bakeplate;
• and
• a system for selectively heating the bakeplate portions with a plurality of heating lamps so as to control temperature of corresponding photoresist portions.