Method and apparatus for using scatterometry to perform feedback and feed-forward control
AssigneeAdvanced Micro Devices, Inc.
InventorsMichael L. Miller, Anthony J. Toprac
Life of this patent
Estimating the term…
Loading patent…
AssigneeAdvanced Micro Devices, Inc.
InventorsMichael L. Miller, Anthony J. Toprac
Estimating the term…
The present invention provides for a method and an apparatus for using scatterometry to perform feedback and feed-forward control. A processing run of semiconductor devices is performed. Metrology data from the processed semiconductor devices is acquired. Error data is acquired by analyzing the acquired metrology data. A determination is made whether the error data merits modification to the processing of semiconductor devices. A feedback modification of the processing of semiconductor devices is performed in response to the determination that the error data merits modification to the processing of semiconductor devices. A feed-forward modification of the processing of the semiconductor devices is performed in response to the determination that the error data merits modification to the processing of semiconductor devices.
A method, comprising:
An apparatus, comprising:
An apparatus, comprising:
A computer readable program storage device encoded with instructions that, when executed by a computer, performs a method, comprising:
Dependencies are inferred from the claim text.