Method and apparatus for improving exhaust gas consumption in an exhaust conduit
AssigneeApplied Materials, Inc.
InventorsKartik Ramaswamy, Dennis S. Grimard, Philip M. Salzman, Liang-Guo Wang, Kwok Manus Wong
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Abstract
A conduit has a heating system disposed therein. The heating system generates heat in response to magnetic flux generated by an inductive coil. The heating system has a heat transfer element and a plurality of ferromagnetic elements. The heat transfer element may be displaced within the conduit to control the amount of heat generated.
Claims39
A heating system for an exhaust conduit of semiconductor processing system comprising:
- a heat transfer element disposed in the exhaust conduit;
- and
- a plurality of ferromagnetic elements in contact with said element.
A semiconductor process system comprising:
- a process chamber;
- an exhaust conduit coupled to the process chamber;
- and
- a heating system disposed within said conduit.
Apparatus for effluent control in a semiconductor processing system having a process chamber and an exhaust pump, the apparatus comprising:
- an exhaust conduit disposed between the process chamber and the exhaust pump;
- a heat transfer element disposed in the exhaust conduit;
- and
- a coil disposed proximate the heat transfer element,
- wherein the heat transfer element is adapted for movement with respect to the coil for adjusting the temperature of the exhaust conduit and the effluent flowing therethrough.
A method of controlling heat in a semiconductor processing system having a process chamber, an exhaust pump and an exhaust conduit disposed therebetween, comprising the steps of:
- positioning a heat transfer element relative to a coil in a first position in the exhaust conduit;
- and
- displacing the heat transfer element to a second position in the exhaust conduit.
Dependencies are inferred from the claim text.