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US 6,641,632 B1Granted
Polishing compositions and use thereof
AssigneeInternational Business Machines Corporation
InventorMaria Ronay
Life of this patent
Estimating the term…
Abstract
Slurry compositions comprising abrasive particles and solid lubricant particles are useful for planarizing surfaces, and preventing delamination and scratches.
Claims16
A chemical mechanical polish slurry composition suitable for microelectronics comprising abrasive particles and solid organic polymeric lubricant particles.
Dependencies are inferred from the claim text.