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US 6,639,259 B2Granted
Charge-coupled device
AssigneeDalsa, Inc.
InventorsJan Theodoor Jozef Bosiers, Agnes Catharina Maria Kleimann, Yvonne Astrid Boersma
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AssigneeDalsa, Inc.
InventorsJan Theodoor Jozef Bosiers, Agnes Catharina Maria Kleimann, Yvonne Astrid Boersma
Estimating the term…
The invention relates to a CCD of the buried-channel type comprising a charge-transport channel in the form of a zone (12) of the first conductivity type, for example the n-type, in a well (13) of the opposite conductivity type, in the example the p-type. In order to obtain a drift field in the channel below one or more gates (9, 10a) to improve the charge transfer, the well is provided with a doping profile, so that the average concentration decreases in the direction of charge transport. Such a profile can be formed by covering the area of the well during the well implantation with a mask, thereby causing fewer ions to be implanted below the gates (9, 10a) than below other parts of the channel. By virtue of the invention, it is possible to produce a gate (10a) combining a comparatively large length, for example in the output stage in front of the output gate (9) to obtain sufficient storage capacity, with a high transport rate.
A charge-coupled device comprising a semiconductor body (11) having a charge-transport channel, situated at a surface, in the form of a zone (12) of a first conductivity type, which is provided in a well (13) of the opposite, i.e. the second conductivity type, a row of electrodes (9, 10) in the form of conductor tracks being provided above the charge-transport channel, said conductor tracks being separated from the underlying semiconductor body by an intermediate dielectric layer, the row of electrodes comprising at least a first electrode (10b) and an adjacent second electrode (10a) which, viewed in the direction of the charge transport, is situated behind the first electrode, characterized in that the average doping concentration of impurity atoms of the second conductivity type in the well is lower at the location of the second electrode than at the location of the first electrode.
A method of manufacturing a charge-coupled device, wherein masked doping is employed to provide a semiconductor body, at a surface, with a zone of a first conductivity type forming a charge-transport channel, and with a well of the opposite, i.e. the second conductivity type, which extends from the surface deeper into the semiconductor body than the zone and surrounds said zone inside the semiconductor body, characterized in that in the doping step of the well, a mask is used which locally masks the surface at the location of the charge-transport channel already present or yet to be formed, as a result of which locally in the well, below the charge-transport channel, a lower doping concentration is obtained than in adjoining parts of the well.
Dependencies are inferred from the claim text.