Pyrazolate copper complexes, and MOCVD of copper using same
AssigneeAdvanced Technology Materials, Inc.
InventorsChongying Xu, Thomas H. Baum, Ziyun Wang
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Abstract
Copper pyrazolate precursor compositions useful for the formation of copper in semiconductor integrated circuits, e.g., interconnect metallization in semiconductor device structures, as an adhesive seed layer for plating, for the deposition of a thin-film recording head and for circuitization of packaging components. The copper pyrazolate precursor compositions include fluorinated and non-fluorinated pyrazolate copper (I) complexes and their Lewis base adducts. Such precursors are usefully employed for liquid delivery chemical vapor deposition of copper or copper-containing material on a substrate.
Claims10
A copper precursor composition comprising a pyrazolate copper (I) Lewis base adduct of the formula (RR′R″)PzCuL, wherein:
- (RR′R″)Pz is a pyrazolyl moiety of the formula:
- R, R′ and R″ are independently the same as or different from one another and each of R, R′ and R″ is independently selected from H, C6-C10 aryl, C6-C10 fluoroaryl, C1-C6 alkyl, C1-C6 fluoroalkyl, C1-C6 perfluoroalkyl, C6-C10 perfluoroaryl and C3-C6 cycloalkyl, with the proviso that at least one of R, R′ and R″ contains fluorine;
- and
- L is a Lewis base ligand.
A copper precursor of the formula (RR′R″)PzCuL wherein:
- (R,R′R″)Pz is a pyrazolyl moiety of the formula:
- and R, R′ and R″ are independently the same as or different from one another and each of R, R′ and R″ is independently selected from H, C6-C10 aryl, C6-C10 fluoroaryl, C1-C6 alkyl, C1-C6 fluoroalkyl, C1-C6 perfluoroalkyl, C6-C10 perfluoroaryl and C3-C6 cycloalkyl, with the proviso that at least one of R, R′ and R″ contains fluorine;
- and L is a Lewis base ligand.
A pyrazolate copper (I) Lewis base adduct precursor composition that is devoid of oxygen constituents therein, wherein said precursor composition comprises a pyrazolyl moiety of the formula:
- wherein R, R′ and R″ are independently the same as or different from one another and each of R, R′ and R″ is independently selected from H, C6-C10 aryl, C6-C10 fluoroaryl, C1-C6 alkyl, C1-C6 fluoroalkyl, C1-C6 perfluoroalkyl, C6-C10 perfluoroaryl and C3-C6 cycloalkyl, with the proviso that at least one of R, R′ and R″ contains fluorine.
A copper precursor composition selected from the group consisting of [(CF3)2PzCu]3, (CF3)2PzCu(3-hexyne), and (CF3)2PzCu[bis(tms)acetylene], wherein Pz is a pyrazolyl moiety and tms is trimethylsilyl.
(CF3)2PzCu(3-hexane), wherein Pz is a pyrazolyl moiety.
Dependencies are inferred from the claim text.