Method of and apparatus for inspecting semiconductor device

A method of inspecting a semiconductor device, wherein one of semiconductor wafers each provided with a plurality of holes is mounted on a stage as a semiconductor wafer under inspection, and assuming that small regions obtained by sectioning a wafer surface of said semiconductor wafer under inspection into a plurality of regions are defined as inspection regions, each of said inspection regions is irradiated with charged particles from a charged-particle irradiation unit and a secondary electron image obtained by irradiation with said charged particles is observed, to inspect whether or not there occurs an opening failure in said holes inside each of said small regions, said method comprising the steps of:

• (a) inputting positional data on at least one specified small region to a control unit, said at least one specified small region being more likely to have said opening failure than the others of said small regions in said wafer surface;
• and
• (b) inspecting whether or not there occurs said opening failure in said at least one specified small region while said control unit relatively moves said charged-particle irradiation unit and said stage on a basis of said positional data so that said at least one specified small region is irradiated with said charged particles,
• wherein said step (a) includes the steps of:
• (a-1) inputting a defective distribution in said wafer surface obtained on a plurality of products already manufactured by using chips obtained from other said semiconductor wafers having the same structure as said semiconductor wafer under inspection to an inspection-region determination unit;
• and
• (a-2) identifying a specified region in said wafer surface, which is likely to have a defect, on the basis of said defective distribution by said inspection-region determination unit, to determine said small region corresponding to said specified region as said specified small region.

A method of inspecting a semiconductor device, wherein one of semiconductor wafers each provided with a plurality of holes is mounted on a stage as a semiconductor wafer under inspection, and assuming that small regions obtained by sectioning a wafer surface of said semiconductor wafer under inspection into a plurality of regions are defined as inspection regions, each of said inspection regions is irradiated with charged particles from a charged-particle irradiation unit and a secondary electron image obtained by irradiation with said charged particles is observed, to inspect whether or not there occurs an opening failure in said holes inside each of said small regions,

• said method comprising the steps of:
• (a) inputting positional data on at least one specified small region to a control unit, said at least one specified small region being more likely to have said opening failure than the others of said small regions in said wafer surface;
• and
• (b) inspecting whether or not there occurs said opening failure in said at least one specified small region while said control unit relatively moves said charged-particle irradiation unit and said stage on a basis of said positional data so that said at least one specified small region is irradiated with said charged particles,
• wherein said at least one specified small region includes a plurality of specified small regions,
• said method further comprising the steps of:
• (c) storing inspection results on other semiconductor wafers having a same structure as said semiconductor wafer under inspection obtained through said method of inspection into a database;
• and
• (d) identifying a failure high-incidence region at which said opening failure frequently occurs in said semiconductor wafers among said plurality of specified small regions while said control unit refers to said database,
• and wherein inspection on whether or not there occurs said opening failure is made only on said failure high-incidence region in said step (b).

A method of inspecting a semiconductor device, wherein one of semiconductor wafers each provided with a plurality of holes is mounted on a stage as a semiconductor wafer under inspection, and assuming that small regions obtained by sectioning a wafer surface of said semiconductor wafer under inspection into a plurality of regions are defined as inspection regions, each of said inspection regions is irradiated with charged particles from a charged-particle irradiation unit and a secondary electron image obtained by irradiation with said charged particles is observed, to inspect whether or not there occurs an opening failure in said holes inside each of said small regions,

• said method comprising the steps of:
• (a) inputting positional data on at least one specified small region to a control unit, said at least one specified small region being more likely to have said opening failure than the others of said small regions in said wafer surface;
• and
• (b) inspecting whether or not there occurs said opening failure in said at least one specified small region while said control unit relatively moves said charged-particle irradiation unit and said stage on a basis of said positional data so that said at least one specified small region is irradiated with said charged particles,
• wherein said plurality of holes include a plurality of said holes belonging to a first group and a plurality of said holes belonging to a second group which are different from each other in intensity of secondary electrons generated from surfaces of said holes by irradiation with said charged particles even when there occurs no opening failure, and
• said step (b) includes the steps of:
• (b-1) grouping said plurality of holes included in said at least one specified small region into said holes belonging to said first group and said holes belonging to said second group;
• (b-2) inspecting whether or not there occurs said opening failure in said holes belonging to said first group;
• and
• (b-3) inspecting whether or not there occurs said opening failure in said holes belonging to said second group, said step (b-3) being separately performed from said step (b-2).

A method of inspecting a semiconductor device, wherein one of semiconductor wafers each provided with a plurality of holes is mounted on a stage as a semiconductor wafer under inspection, and assuming that small regions obtained by sectioning a wafer surface of said semiconductor wafer under inspection into a plurality of regions are defined as inspection regions, each of said inspection regions is irradiated with charged particles from a charged-particle irradiation unit and a secondary electron image obtained by irradiation with said charged particles is observed, to inspect whether or not there occurs an opening failure in said holes inside each of said small regions,

• said method comprising the steps of:
• (a) storing inspection results on other semiconductor wafers having a same structure as said semiconductor wafer under inspection obtained through said method of inspection into a database;
• (b) identifying a failure high-incidence region at which said opening failure frequently occurs in said semiconductor wafers among said plurality of small regions while a control unit refers to said database;
• and
• (c) inspecting whether or not there occurs said opening failure in said failure high incidence region while said control unit relatively moves said charged-particle irradiation unit and said stage so that said failure high-incidence region is irradiated with said charged particles in said semiconductor wafer under inspection.

An apparatus for inspecting a semiconductor device, comprising:

• a stage on which one of semiconductor wafers each provided with a plurality of holes is mounted as a semiconductor wafer under inspection;
• a charged-particle irradiation unit for irradiating one of inspection regions with charged particles, said inspection regions being small regions obtained by sectioning a wafer surface of said semiconductor wafer under inspection into a plurality of regions;
• a failure judgment unit for judging whether or not there occurs an opening failure in said holes inside each of said small regions by observing a secondary electron image obtained by irradiation with said charged particles;
• a control unit for relatively moving said charged-particle irradiation unit and said stage on a basis of positional data on a specified small region which is more likely to have said opening failure than the others of said small regions in said wafer surface so that said specified small region is irradiated with said charged particles;
• and
• an inspection-region determination unit for identifying said specified small region on the basis of design data on said semiconductor wafer under inspection.

An apparatus for inspecting a semiconductor device, comprising:

• a stage on which one of semiconductor wafers each provided with a plurality of holes is mounted as a semiconductor wafer under inspection;
• a charged-particle irradiation unit for irradiating one of inspection regions with charged particles, said inspection regions being small regions obtained by sectioning a wafer surface of said semiconductor wafer under inspection into a plurality of regions;
• a failure judgment unit for judging whether or not there occurs an opening failure in said holes inside each of said small regions by observing a secondary electron image obtained by irradiation with said charged particles;
• a control unit for relatively moving said charged-particle irradiation unit and said stage on a basis of positional data on a specified small region which is more likely to have said opening failure than the others of said small regions in said wafer surface so that said specified small region is irradiated with said charged particles;
• and
• an inspection-region determination unit for identifying a specified region in said wafer surface, which is likely to have a defect, on the basis of a defective distribution in said wafer surface obtained on a plurality of products already manufactured by using chips obtained from other said semiconductor wafers having the same structure as said semiconductor wafer under inspection, to determine said small region corresponding to said specified region as said specified small region.

An apparatus for inspecting a semiconductor device, comprising:

• a stage on which one of semiconductor wafers each provided with a plurality of holes is mounted as a semiconductor wafer under inspection;
• a charged-particle irradiation unit for irradiating one of inspection regions with charged particles, said inspection regions being small regions obtained by sectioning a wafer surface of said semiconductor wafer under inspection into a plurality of regions;
• a failure judgment unit for judging whether or not there occurs an opening failure in said boles inside each of said small regions by observing a secondary electron image obtained by irradiation with said charged particles;
• a control unit for relatively moving said charged-particle irradiation unit and said stage on a basis of positional data on a specified small region which is more likely to have said opening failure than the others of said small regions in said wafer surface so that said specified small region is irradiated with said charged particles;
• and
• a database storing inspection results on other semiconductor wafers having a same structure as said semiconductor wafer under inspection obtained by using said apparatus for inspection, which can be referred to by said control unit.

An apparatus for inspecting a semiconductor device, comprising:

• a stage on which one of semiconductor wafers each provided with a plurality of holes is mounted as a semiconductor wafer under inspection;
• a charged-particle irradiation unit for irradiating one of inspection regions with charged particles, said inspection regions being small regions obtained by sectioning a wafer surface of said semiconductor wafer under inspection into a plurality of regions;
• a failure judgment unit for judging whether or not there occurs an opening failure in said holes inside each of said small regions by observing a secondary electron image obtained by irradiation with said charged particles;
• a control unit for relatively moving said charged-particle irradiation unit and said stage on a basis of positional data on a specified small region which is more likely to have said opening failure than the others of said small regions in said wafer surface so that said specified small region is irradiated with said charged particles,
• wherein said plurality of holes include a plurality of said holes belonging to a first group and a plurality of said holes belonging to a second group which are different from each other in intensity of secondary electrons generated from surfaces of said holes by irradiation with said charged particles even when there occurs no opening failure, and
• said failure judgment unit has a hole grouping unit for grouping said plurality of holes included in said specified small region into said holes belonging to said first group and said holes belonging to said second group.