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US 6,635,579 B2Granted
Operating method of a semiconductor etcher
AssigneeMacronix International Co., Ltd.
InventorsMing-Chung Liang, Shin-Yi Tsai, Hsu-Sheng Yu, Chun-Hung Lee
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Abstract
An operating method of a semiconductor etcher includes three steps. The first step is to provide a first power for shortening a warm-up time of the etcher. The second step is to provide a second power, which is lower than the first power, to perform an etching process. The third step is to provide a third power, which is between the first and second power, for cleaning the etcher.
Claims5
An operating method of a semiconductor etcher comprising:
- providing first power to the etcher for shortening warm up time of the etcher;
- providing second power which is lower than the first power to the etcher for performing an etching process;
- and
- providing third power which is between the first and second power to the etcher for cleaning the etcher;
- wherein the etcher is warmed up before cleaning the etcher and performing the etching process.
2 more elements
Dependencies are inferred from the claim text.