Resist pattern forming method, frame plating method and manufacturing method of thin-film magnetic head

A frame plating method comprising the steps of:

• forming a resist pattern on a substrate or on a layer formed on a substrate using a resist material containing a material which generates acid by exposure or heating;
• coating only a water-soluble cross-linking agent on said resist pattern, wherein said water-soluble cross-linking agent is capable of being cross-linked in the presence of acid;
• coating a resin material containing at least a water-soluble resin on said water-soluble cross-linking agent;
• exposing or heating said resist pattern to generate acid from the resist pattern, wherein a cross-linking reaction of said water-soluble cross-linking agent occurs in the presence of the generated acid to form a covering layer over said resist pattern;
• plating a pattern using said resist pattern with the covering layer as a frame;
• and
• removing said resist pattern with the covering layer.

A method of manufacturing a thin-film magnetic head comprising the steps of:

• forming a resist pattern on a substrate or on a layer formed on a substrate using a resist material containing a material which generates acid by exposure or heating;
• coating only a water-soluble cross-linking agent on said resist pattern, wherein said water-soluble cross-linking agent is capable of being cross-linked in the presence of acid;
• coating a resin material containing at least a water-soluble resin on said water-soluble cross-linking agent;
• exposing or heating said resist pattern to generate acid from the resist pattern, wherein a cross-linking reaction of said water-soluble cross-linking agent occurs in the presence of the generated acid to form a covering layer over said resist pattern;
• plating a magnetic pole using said resist pattern with the covering layer as a frame;
• and
• removing said resist pattern with the covering layer.