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US 6,635,401 B2Granted
Resist compositions with polymers having 2-cyano acrylic monomer
AssigneeInternational Business Machines Corporation
InventorsWenjie Li, Pushkara Rao Varanasi
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Abstract
Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation and/or possibly other radiation and are developable to form resist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing imaging polymer having a 2-cyano acrylic monomer.
Claims16
A resist composition comprising (a) an imaging polymer, and (b) a radiation sensitive acid generator, said imaging polymer comprising cyano-modified acrylic monomer units comprising an acrylic moiety with a cyano group pendant therefrom.
Dependencies are inferred from the claim text.