Method for preparing an optical thin film
AssigneeAsahi Glass Company, Limited
InventorsMasao Miyamura, Kazuhiko Mitarai, Satoru Takaki
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Abstract
A method for forming an optical thin film having multiple optical layers on the surface of a substrate using a magnetron sputtering apparatus with a sputtering chamber having cathodes, the substrate, and at least two kinds of targets disposed therein. An inert gas and a reactive gas are introduced into the sputtering chamber to form at least some of the multiple optical layers on the substrate by successively alternately repeatedly forming at least two kinds of optical layers each having a different optical constant by means of the reactive magnetron sputtering apparatus under a condition of a discharge pressure being no greater than 1.3×10−1 Pa.
Claims23
A method for preparing an optical thin film having multiple optical layers on a substrate using a magnetron sputtering apparatus having cathodes and at least two kinds of targets disposed in a sputtering chamber of the magnetron sputtering apparatus along with the substrate, said method comprising the steps of:
- introducing an inert gas and a reactive gas into the sputtering chamber;
- and
- forming at least some of the multiple optical layers on the substrate by successively alternately repeatedly forming at least two kinds of optical layers each having a different optical constant by means of the reactive magnetron sputtering apparatus under a condition of providing a discharge pressure no greater than 1.3×10−1 Pa.
Dependencies are inferred from the claim text.