Laser heating apparatus
AssigneeJapan Science and Technology Kawaguchi
InventorsHideomi Koinuma, Masashi Kawasaki
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Abstract
A laser heating apparatus (20) for heating a thin film forming substrate (1) in a thin film manufacturing process is disclosed. The substrate (1) set in position in a vacuum chamber (101) of a film forming apparatus (100) is irradiated with a laser light and is thereby heated to a desired temperature. The laser light is guided to a region of the substrate (1) by means of an optical fiber (23), and the laser beams emanating from the outlet end of the optical fiber (23) is incident directly or indirectly via a reflecting mirror (33) on the substrate (1). The optical fiber (23) is sheathed with a jacket tube (24) whose interior is vacuum drawn. Using a laser light enables the arrangement to be used even in an oxidizing atmosphere and even an insulating substrate to be heated.
Claims5
A laser heating apparatus for heating thin film forming substrates,
- wherein a thin film forming substrate set in place on a substrate supporting mechanism in a vacuum chamber of a film forming apparatus is irradiated with a laser light so as to be heated to a predetermined temperature, and
- wherein the laser light is guided by means of an optical fiber to a region of said substrate, and said substrate is irradiated directly or indirectly with the laser light arriving from an outlet end of said optical fiber.
Dependencies are inferred from the claim text.