Evaluating method of hydrophobic process, forming method of resist pattern, and forming system of resist pattern

A resist pattern forming method comprising the steps of:

• analyzing a quantity of an ionic species in a sample hydrophobic gas of a known concentration previously;
• supplying a hydrophobic process gas to a surface of a substrate to perform a hydrophobic process to the corresponding surface;
• coating the surface of the substrate with a resist;
• supplying a developing solution to the surface of the substrate subjected to exposure to light to perform developing;
• detecting quantity of the ionic species of the hydrophobic process gas on the surface of the substrate subjected to the hydrophobic process;
• evaluating the hydrophobic process state by comparing the analyzed result with the detected result;
• and
• adjusting a process condition of said hydrophobic process based on the evaluation.

A method of processing a substrate, comprising the steps of:

• obtaining a correlation of data between a quantity of a hydrophobic process gas on a surface of the substrate subjected to a hydrophobic processing and an adhesion of a resist pattern on the substrate previously;
• supplying a hydrophobic process gas to a surface of a substrate to perform a hydrophobic process to the corresponding surface;
• measuring the quantity of the hydrophobic process gas on the surface of the substrate subjected to the hydrophobic process;
• evaluating the hydrophobic process state based on the correlation of data and the measured quantity of the hydrophobic process gas;
• and adjusting a process condition of said hydrophobic process based on the evaluation.