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US 6,616,870 B1Granted
Method of producing high aspect ratio domes by vapor deposition
AssigneeShipley Company, L.L.C.
InventorsJitendra S. Goela, Zlatko Salihbegovic
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Abstract
An apparatus for the manufacture of chemical vapor deposited domes. The apparatus has a vapor deposition chamber with a plurality of sides, a base and a top where the base has a reactant port for receiving a flow of chemical reactants. A male mandrel is joined to one of a plurality of sides of the deposition chamber such that the flow of chemical reactants in the vapor deposition chamber does not impinge on the mandrel.
Claims12
A method for preparing high aspect ratio domes comprising:
- (a) providing at least one male mandrel in a chemical vapor deposition chamber such that the at least one male mandrel is oriented in the deposition chamber at a distal position to reactant flow pathways and convection current pathways such that a flow of reactants and convection currents in the deposition chamber do not impinge on the mandrel,
- (b) generating the reactants as gases from a source of reactants,
- (c) passing the gas reactants through the deposition chamber and past the mandrel such that the flow of gas reactants does not impinge on the mandrel;
- and
- (d) depositing the gas reactants on the at least one mandrel by diffusion to form at least one dome with an aspect ratio of greater than 0.1.
2 more elements
Dependencies are inferred from the claim text.