Mask correction optimization

A process of designing a mask for use in a photolithographic process to offset effects of light diffraction comprising steps of:

• a) identifying at least one region of each of a plurality of edges of a mask feature, each identified region having a length along the respective edge;
• b) deriving a matrix of contributions of movement factors that define changes in light value due to movement of each region normal to the edge;
• c) moving each region by an amount derived from the matrix;
• and
• d) adjusting the amount of movement for each region whose area of movement is affected by movement of an adjacent region.

A computer usable medium having a computer readable program embodied therein for addressing data, the computer readable program in the computer usable medium comprising:

• first computer readable program code defining a mask for use in a photolithographic process, the mask having at least one feature having a plurality of edges, the first computer readable program code further defining at least one region having a length along each edge of the mask feature;
• second computer readable program code defining a table of light values and distances from a center of a light disk;
• third computer readable program code for causing the computer to identify a length of each line between a midpoint of each region and each of a plurality of points along edges of the mask feature;
• fourth computer readable program code for causing the computer to derive a contribution of movement factor for each line based on (i) the light value corresponding to the distance that matches the length of the respective line, (ii) the length of the respective region, and (iii) a size of the light disk;
• and
• fifth computer readable program code for causing the computer to derive a matrix of contributions of movement factors;
• and
• sixth computer readable program code for causing the computer to define movement for each region by an amount derived from the matrix.

A computer usable medium having a computer readable program embodied therein for addressing data, the computer readable program in the computer usable medium comprising:

• first computer readable program code for causing the computer to define a mask for use in a photolithographic process, the mask having at least one feature having a plurality of edges, the first computer readable program code further defining at least one region having a length along each edge of the mask feature;
• second computer readable program code for causing the computer to derive a matrix of contribution of movement factors defining contributions to light value due to movement of each region normal to the edge;
• third computer readable program code for causing the computer to define movement for each region by an amount derived from the matrix;
• and
• fourth computer readable program code for causing the computer to adjust the amount of movement of each region whose area of movement is affected by movement of an adjacent region.

A process of designing a mask for use in a photolithographic process to offset effects of light diffraction comprising steps of:

• a) identifying at least one region of each of a plurality of edges of a mask feature, each identified region having a length along the respective edge;
• b) identifying a plurality of points along edges of the mask feature;
• c) deriving a matrix of contributions of movement factors that define changes in light value due to movement of each region normal to the region;
• d) calculating an error value for each point,
• e) deriving a plurality of linear expressions from the matrix, each expression containing a set of variables, each variable representing movement of a respective region;
• f) deriving a cost function for all points based on the respective linear expression and error value;
• g) calculating the movement for each region based on a minimum cost function;
• and
• h) moving each region by the calculated amount.

A computer usable medium having a computer readable program embodied therein for addressing data, the computer readable program in the computer usable medium comprising:

• first computer readable program code defining a mask for use in a photolithographic process, the mask having at least one feature having a plurality of edges, the first computer readable program code further defining at least one region having a length along each edge of the mask feature;
• second computer readable program code for causing the computer to derive a matrix of contribution of movement factors defining contributions to light value due to movement of each region normal to the edge;
• third computer readable program code for causing the computer to derive a plurality of linear expressions from the matrix, each expression containing a set of variables, each variable representing movement of the respective region;
• fourth computer readable program code for causing the computer to calculate an error value for each of a plurality of points along edges of the mask feature;
• fifth computer readable program code for causing the computer to derive a cost function for all points based on the respective linear expression and error value;
• and
• sixth computer readable program code for causing the computer to calculate the amount of movement for each region based on a minimum cost function.