Method for recycling organometallic compound for MOCVD
AssigneeTanaka Kikinzoku Kogyo K.K.
InventorMasayuki Saito
Life of this patent
Estimating the term…
Loading patent…
AssigneeTanaka Kikinzoku Kogyo K.K.
InventorMasayuki Saito
Estimating the term…
The present invention is a method for recycling an organometallic compound for MOCVD comprising extracting an unreacted organometallic compound from a used raw material which has undergone a thin film production process, wherein the unreacted organometallic compound is extracted after the used raw material is subjected to a reforming treatment. The method for reforming the used raw material is either a method for contacting the used raw material with a hydrogenation catalyst or a reducing agent or a method for contacting the used raw material with either a halogen, a hydrogen halide, an inorganic acid, an alkene, or a diene. In this case, an organometallic compound of higher purity can be obtained through this recycling method by contacting the used raw material with a decoloring agent comprising activated carbon, silica, or activated clay.
A method for recycling an organometallic compound for MOCVD, comprising extracting an unreacted organometallic compound from a used raw material which has undergone a thin film production process,
A method for recycling an organometallic compound for MOCVD, comprising extracting an unreacted organometallic compound from a used raw material which has undergone a thin film production process,
Dependencies are inferred from the claim text.