Photosensitive compound and photosensitive resin
AssigneeToyo Gosai Kogyo Co., Ltd.
InventorsKentaro Tada, Toru Shibuya
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Abstract
The invention provides a photosensitive compound which can be used to prepare a photosensitive resin, and a photosensitive resin obtained from the compound. The compound has a moiety represented by formula (I) or (II): wherein R1 represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group; Y is selected from the following formula groups: wherein each of R2 and R3 represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group, and l is an integer of 1 to 5; and Ar is selected from the following formula groups: wherein X represents lithium, sodium, potassium, ammonium, monoalkylammonium, dialkylammonium, trialkylammonium, or tetraalkylammonium.
Claims5
A photosensitive compound having a moiety represented by the following formula (I) or (II):
- wherein
- Rx is a saponified product of poly(vinyl acetate) chain or a substituent containing an acetal group or a substituent containing an aldehyde group, and R1 represents a hydrogen atom, a C≦6 alkyl group, a phenyl group, or a benzyl group;
- Y is selected from the following formula groups:
- wherein each of R2 and R3 represents a hydrogen atom or an alkyl group, and l is an integer of 1 to 5;
- and
- Ar is selected from the following formula groups;
- wherein X represents lithium sodium, potassium, ammonium, monoalkylammonium, dialkylammonium, trialkylammonium, or tetraalkylammonium.
Dependencies are inferred from the claim text.