Exposure apparatus and device manufacturing method

An exposure method for an exposure apparatus having an illumination system for transferring a pattern formed on a master onto a photosensitive member by exposure light and a stop for setting an illumination region on the photosensitive member by the exposure light, said method comprising:

• an exposure step of forming an exposure region by performing exposure while scanning the illumination region on the photosensitive member in a first direction;
• an exposure control step of forming a plurality of exposure regions by connecting the formed exposure regions in a second direction perpendicular to the first direction with regions superposed on each other by repeatedly executing the exposure step, thereby forming the transfer pattern on the photosensitive member;
• and
• a stop driving step of, in forming the exposure regions in the exposure step, driving the stop and controlling an aperture portion of the stop to form a gradual reduction region where an exposure light amount gradually decreases outward from the exposure regions in the superposed regions of the exposure regions,
• wherein the aperture of the stop is formed by a plurality of vanes, and said stop driving step comprises moving a vane of the stop on a side of the superposed regions in the second direction during the scanning in the first direction.

A device manufacturing method of manufacturing a semiconductor device, said method comprising:

• a step of supplying a substrate to an exposure apparatus;
• and
• a step of transferring a pattern formed on a master onto the substrate using the exposure apparatus,
• wherein the exposure apparatus comprises:
• (i) an illumination system for transferring a pattern formed on a master onto a photosensitive member by exposure light;
• (ii) a stop for setting an illumination region on the photosensitive member by the exposure light;
• (iii) an exposure control system for forming a plurality of exposure regions by performing exposure while scanning the illumination region on the photosensitive member in a first direction, the plurality of exposure regions forming a transfer pattern on the photosensitive member by connecting the formed exposure regions in a second direction perpendicular to the first direction with regions superposed on each other;
• and
• (iv) a stop driving system for, in forming the exposure regions, driving the stop and controlling an aperture portion of the stop to form a region where an exposure light amount gradually decreases outward from the exposure regions in the superposed regions of the exposure regions,
• wherein the aperture of the stop is formed by a plurality of vanes, and said stop driving system moves a vane of the stop on a side of the superposed regions in the second direction during scanning in the first direction.