Reference plate, exposure apparatus, device manufacturing system, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method
AssigneeCanon Kabushiki Kaisha
InventorsNobuyoshi Deguchi, Tetsuya Mori
Life of this patent
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Abstract
A reference plate used with an exposure apparatus that emits an exposure beam to irradiate a reference mark pattern with observation light, to detect the reflected light, and to obtain a position of the reference mark pattern. A respective reference plate is fixed on a mask stage and a wafer stage of the exposure apparatus for exposing a wafer on the wafer stage to a mask pattern on the mask stage, and a surface of the reference mark pattern, which is an observation light irradiation surface side of the exposure apparatus, is not directly exposed to the surrounding atmosphere.
Claims17
A reference plate used with an exposure apparatus that emits an exposure beam to irradiate a reference mark pattern with observation light, to detect light reflected from the reference mark pattern, and to obtain a position of the reference mark pattern,
- wherein a respective reference plate is fixed on a mask stage and a wafer stage of the exposure apparatus for exposing a wafer on the wafer stage to a mask pattern on the mask stage;
- and
- a surface of the reference mark pattern, which is an observation light irradiation surface side of the exposure apparatus, is not directly exposed to the surrounding atmosphere.
An exposure apparatus for exposing a wafer to a mask pattern, the exposure apparatus comprising:
- reference plates having reference patterns formed at positions where the reference patterns are not directly exposed to observation light, the reference plates including a mask reference plate formed on a mask stage for supporting a mask and a wafer reference plate formed on a wafer stage for supporting the wafer.
An exposure apparatus for exposing a wafer to a mask pattern, the exposure apparatus comprising:
- a display;
- a network interface;
- and
- a computer for executing network software,
- wherein maintenance information of the exposure apparatus can be communicated via a computer network, and
- the exposure apparatus uses reference plates having reference patterns formed at positions where the reference patterns are not directly exposed to observation light, the reference plates including a mask reference plate formed on a mask stage for supporting a mask and a wafer reference plate formed on a wafer stage for supporting the wafer.
Dependencies are inferred from the claim text.