Positive photosensitive resin composition
AssigneeSumitomo Electric Industries, Ltd.
InventorsHiroaki Makabe, Toshio Banba, Takashi Hirano
Life of this patent
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Abstract
The present invention provides a positive photosensitive resin composition which can form a pattern of high resolution and high residual film ratio and has high sensitivity. That is, the present invention provides a positive photosensitive resin composition comprising 100 parts by weight of a polyamide resin and 1 to 50 parts by weight of a photosensitizer represented by, for example, the following formula (Q-1):
Claims21
A positive photosensitive resin composition comprising:
- 100 parts by weight of (A) a polyamide resin represented by the following general formula (1), and
- 1 to 50 parts by weight of (B1) a photosensitizer which is a 1,2-naphthoquinone-2-diazide-5-sulfonate or a 1,2-naphthoquinone-2-diazide-4-sulfonate, of a phenol compound having a skeletal structure represented by the following general formula (2):
- wherein X is a tetravalent cyclic compound group;
- Y is a divalent cyclic compound group;
- Z is a group represented by
- wherein R1 and R2 are each a divalent organic group, and R3 and R4 are each a monovalent organic group;
- E is an aliphatic group or a cyclic compound group, each having at least one alkenyl or alkynyl group;
- a and b each show a molar fraction, a+b=100 mole %, a=60 to 100 mole %, and b=0 to 40 mole %;
- and n is an average value and a positive number of 2 to 300, and
- wherein R5 is one atom or group selected from hydrogen atom, alkyl groups, alkoxy groups, aryl groups and substituted aryl groups;
- a plurality of R6's may be the same or different and are each one atom or group selected from hydrogen atom, hydroxyl group, alkyl groups, alkoxy groups, aryl groups and cycloalkyl groups, and at least one R6 is hydroxyl group;
- a plurality of R7's may be the same or different and are each one atom or group selected from hydrogen atom, hydroxyl group, alkyl groups, alkoxy groups, aryl groups and cycloalkyl groups, and at least one R7 is hydroxyl group;
- 1 is an integer of 0 to 3;
- m is an integer of 1 to 3;
- and n is an integer of 1 to 3.
A positive photosensitive resin composition comprising:
- 100 parts by weight of (A) a polyamide resin represented by the general formula (1),
- wherein X is a tetravalent cyclic compound group;
- Y is a divalent cyclic compound group;
- Z is a group represented by
- wherein R1 and R2 are each a divalent organic group, and R3 and R4 are each a monovalent organic group;
- E is an aliphatic group or a cyclic compound group, each having at least one alkenyl or alkynyl group;
- a and b each show a molar fraction, a+b=100 mole %, a=60 to 100 mole %, and b=0 to 40 mole %;
- and n is an average value and a positive number of 2 to 300,
- 1 to 50 parts by weight of (B1) a photosensitizer which is a 1,2-naphthoquinone-2-diazide-5-sulfonate or a 1,2-naphthoquinone-2-diazide-4-sulfonate, of a phenol compound havinq a skeletal structure represented by the general formula (2),
- wherein R5 is one atom or group selected from hydrogen atom, alkyl groups, alkoxy groups, aryl groups and substituted aryl groups;
- a plurality of R6's may be the same or different and are each one atom or group selected from hydrogen atom, hydroxyl group, alkyl groups, alkoxy groups, aryl groups and cycloalkyl groups, and at least one R6 is hydroxyl group;
- a plurality of R7's may be the same or different and are each one atom or group selected from hydrogen atom, hydroxyl group, alkyl groups, alkoxy groups, aryl groups and cycloalkyl groups, and at least one R7 is hydroxyl group;
- 1 is an integer of 0 to 3;
- m is an integer of 1 to 3;
- and n is an integer of 1 to 3, and
- 1 to 30 parts by weight of (C) a phenol compound represented by the following general formula (3):
- wherein R8 and R9 are each hydrogen atom or an alkyl group;
- and R10, R11, R12 and R13 are each one atom or group selected from hydrogen atom, halogen atoms, hydroxyl group, alkyl groups, alkoxy groups and cycloalkyl groups.
A positive photosensitive resin composition comprising:
- 100 parts by weight of (A) a polyamide resin represented by the general formula (1),
- wherein X is a tetravalent cyclic compound group;
- Y is a divalent cyclic compound group;
- Z is a group represented by
- wherein R1 and R2 are each a divalent organic group, and R3 and R4 are each a monovalent organic group;
- E is an aliphatic group a cyclic compound group, each having at least one alkenyl or alknyl group;
- a and b each show a molar fraction, a+b=100 mole %, a=60 to 100 mole %, and b=0 to 40 mole %;
- and n is an average value and a positive number of 2 to 300,
- 1 to 50 parts by weight of (B1) a photosensitizer which is a 1,2-naphthoquinone-2-diazide-5-sulfonate or a 1,2-naphthoquinone-2-diazide-4-sulfonate, of a phenol compound having a skeletal structure represented by the general formula (2),
- wherein R5 is one atom or group selected from hydrogen atom, alkyl groups, alkoxy groups, aryl groups and substituted aryl groups;
- a plurality of R6's may be the same or different and are each one atom or group selected from hydrogen atom, hydroxyl group, alky groups, alkoxy groups, aryl groups and cycloalkyl groups, and at least one R6 is hydroxyl group;
- a plurality of R7's may be the same or different and are each one atom or group selected from hydrogen atom, hydroxyl group, alkyl groups, alkoxy groups, aryl groups and cycloalkyl groups, and at least one R7 is hydroxyl group;
- 1 is an integer of 0 to 3;
- m is an integer of 1 to 3;
- and n is an integer of 1 to 3,
- 0.1 to 25 parts by weight of (B2) a photosensitizer which is a 1,2-naphthoquinone-2-diazide-5-sulfonate or a 1,2-naphthoquinone-2-diazide-4-sulfonate, of a phenol compound having a skeletal structure represented by the following general formula (4) or (5),
- wherein R14 is hydrogen atom or an alkyl group;
- and R15, R16, R17, R18, R19 and R20 are each one atom or group selected from hydrogen atom, halogen atoms, hydroxyl group, alkyl groups, alkoxy groups and cycloalkyl groups, or
- wherein R21, R22, R23, R24, R25, R26, R27, R28 and R29 are each one atom or group selected from hydrogen atom, halogen atoms, hydroxyl group, alkyl groups, alkoxy groups and cycloalkyl groups, and
- 1 to 30 parts by weight of (C) a phenol compound represented by the following general formula (3):
- wherein R8 and R9 are each hydrogen atom or an alkyl group;
- and R10, R11, R12 and R13 are each one atom or group selected from hydrogen atom, halogen atoms, hydroxyl group, alkyl groups, alkoxy groups and cyloalkyl groups.
Dependencies are inferred from the claim text.