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US 6,607,634 B2Granted
Reticle adapter for a reactive ion etch system
AssigneeApplied Materials, Inc.
InventorsYan Ye, Richard W. Plavidal
Life of this patent
Estimating the term…
Abstract
A reticle adapter that is capable of supporting a reticle in a conventional reactive ion etch chamber that is designed for etching circular silicon wafers. The adapter has a lower portion that is milled to cover the upper portion of a pedestal within a reactive ion etch chamber. A top portion of the adapter has an opening that is sized and shaped to hold a reticle.
Claims48
A reactive ion etch chamber comprising:
- a pedestal having a support surface;
- and
- an adapter having a first side that covers said support surface of said pedestal and a second side to support a photolithography reticle within the chamber.
A reactive ion etch chamber, comprising:
- a pedestal having a support surface;
- and
- an adapter having a first portion on a first side that matches the size and shape of the support surface of the pedestal and a second portion on a second side that is adapted to support a photolithography reticle.
A reactive ion etch chamber, comprising:
- a pedestal having a support surface;
- and
- adapting means for supporting a photolithography reticle on the support surface of the pedestal.
Dependencies are inferred from the claim text.