Method of lithography using vacuum ultraviolet radiation
OwnerBarry Gelerntinventor
Life of this patent
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Abstract
A method of vacuum ultraviolet (VUV) lithography in which an irradiating wavelength is selected to be in a region of low absorption in air, e.g., one in the vicinity of a local minimum in an oxygen absorption spectrum. In one embodiment, a lithographic exposure wavelength is advantageously selected between 121.0 nm to 122.0 nm, preferably at about 121.6 nm, corresponding to an absorption window in the oxygen spectrum. This method relaxes the otherwise stringent vacuum and inert gas purge requirement imposed on a VUV lithographic tool.
Claims14
A method of lithography comprising:
- (a) providing a radiation-sensitive material;
- and
- (b) exposing said radiation-sensitive material to vacuum ultraviolet radiation having a wavelength between about 121.0 and 122.0 nm.
A method of lithography comprising:
- (a) providing radiation-sensitive material;
- and
- (b) exposing said radiation-sensitive material to vacuum ultraviolet radiation having a wavelength in the vicinity of a minimum in the oxygen absorption spectrum, wherein said wavelength is between about 121.0 and about 122.0 nm.
An apparatus for vacuum ultraviolet lithography, the apparatus comprising:
- (a) a hydrogen-containing or deuterium-containing source for providing vacuum ultraviolet radiation;
- (b) an optical imaging means to cause said vacuum ultraviolet radiation to be incident upon a substrate;
- and
- (c) said substrate comprising a radiation sensitive material that is exposed to said vacuum ultraviolet radiation.
An apparatus for vacuum ultraviolet lithography, the apparatus comprising:
- (a) a source of vacuum ultraviolet radiation comprising a wavelength whose corresponding absorption coefficient of oxygen (O2) is less than about 25 atm−1 cm−1 at standard temperature and pressure;
- (b) an optical imaging means to cause said vacuum ultraviolet radiation to be incident upon a substrate;
- and
- (c) said substrate comprising a radiation sensitive material that is exposed to said vacuum ultraviolet radiation.
Dependencies are inferred from the claim text.