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AssigneePraxair S.T. Technology, Inc.
InventorsAndrew C. Perry, Paul S. Gilman, Jaak Van den Sype
Estimating the term…
An aluminum alloy sputter target having a sputter target face for sputtering the sputter target is provided. The sputter target face has a textured-metastable grain structure. The textured-metastable grain structure has a grain orientation ratio of at least 35 percent (200) orientation. The textured-metastable grain structure is stable during sputtering of the sputter target. The textured-metastable grain structure has a grain size of less than 5 μm. The method forms aluminum alloy sputter targets by first cooling an aluminum alloy target blank to a temperature of less than −50° C. Then deforming the cooled aluminum alloy target blank introduces plastic strain into the target blank and reduces the grain size of the grains to form a textured-metastable grain structure. Finally, finishing the aluminum alloy target blank forms a finished sputter target that maintains the textured-metastable grain structure of the finished sputter target.
An aluminum alloy sputter target, the sputter target having a sputter target face for sputtering the sputter target, the sputter target face having a textured-metastable grain structure, the textured-metastable grain structure having a grain orientation ratio of at least about 35 percent (200) orientation, the textured-metastable grain structure being stable during sputtering of the sputter target, the textured-metastable grain structure having a grain size of less than about 5 μm.
An aluminum alloy sputter target, the sputter target having a sputter target face for sputtering the sputter target, the sputter target face having a textured-metastable grain structure, the textured-metastable grain structure having a grain orientation ratio of at least about 35 percent (200) orientation, the textured-metastable grain structure being stable during sputtering of the sputter target, the textured-metastable grain structure having a grain size of less than about 2 μm.
An aluminum alloy sputter target, the aluminum alloy being selected from the group consisting of aluminum-copper, aluminum-silicon, and aluminum-copper-silicon alloys, and the sputter target having a sputter target face for sputtering the sputter target, the sputter target face having a textured-metastable grain stricture, the textured-metastable grain structure having a grain orientation ratio of at least about 35 percent (200) orientation, the textured-metastable grain structure being stable during sputtering of the sputter target, the textured-metastable grain structure having a grain size of less than about 1 m.
Dependencies are inferred from the claim text.