Substrate cleaning apparatus and method
AssigneeApplied Materials, Inc.
InventorYu Lei Shih
Life of this patent
Estimating the term…
Abstract
A substrate cleaning apparatus includes a chamber having a substrate support capable of supporting and rotating a substrate in the chamber. A cleaning solution injector is provided to inject a cleaning solution onto the substrate in the chamber. A portion of the cleaning solution is thrown off the rotating substrate to form a cleaning solution mist in the chamber. A cleaning gas inlet introduces a cleaning gas into the chamber and an outlet exhausts the cleaning solution mist and cleaning gas from the chamber. This reduces the formation of residues from the cleaning solution mist on the substrate.
Claims15
A substrate cleaning apparatus comprising:
- a chamber;
- a substrate support capable of supporting and rotating a substrate in the chamber;
- a cleaning solution injector capable of injecting a cleaning solution onto the substrate in the chamber, thereby forming a cleaning solution mist in the chamber, the cleaning solution injector being located at a sidewall of the chamber;
- a cleaning gas inlet capable of introducing a cleaning gas into the chamber, the cleaning gas inlet being located at a top of the chamber;
- and
- an outlet capable of exhausting the cleaning gas end the cleaning solution mist.
A substrate cleaning apparatus comprising:
- a chamber;
- a substrate support in the chamber, the substrate support capable of supporting a substrate and rotating the substrate in the chamber;
- an upper cleaning solution injector nozzle, located at a sidewall of the chamber and higher than the substrate the injector nozzle capable of injecting a cleaning solution into the chamber;
- a lower cleaning solution injector nozzle, located at the sidewall of the chamber and lower than the substrate, the injector nozzle capable of injecting the cleaning solution into the chamber;
- a cleaning gas inlet located at a top of the chamber, the cleaning gas inlet capable of introducing a cleaning gas into the chamber;
- and
- a plurality of outlets located at the sidewall of the chamber, the outlets capable of exhausting from tile chamber, a cleaning solution mist formed from the cleaning solution and the cleaning gas.
A substrate cleaning apparatus comprising:
- a chamber;
- a substrate support capable of supporting and rotating a substrate in the chamber;
- a cleaning solution injector capable of injecting a cleaning solution onto the substrate in the chamber, thereby forming a cleaning solution mist in the chamber, the cleaning solution injector being located at a sidewall of the chamber;
- means for introducing a cleaning gas into the chamber from top of the chamber;
- and
- means for exhausting the cleaning solution mist and cleaning gas from the chamber.
Dependencies are inferred from the claim text.