Illuminance measurement apparatus, exposure apparatus, and exposure method

An exposure apparatus for transferring a pattern of a mask on to a substrate by exposure light, said exposure apparatus comprising

• a stage which holds said substrate and adjusts at least one of a position and posture of said substrate,
• a detection device which irradiates detection light toward an object on said stage and receives the light reflected at the object to detect at least one of the position and posture of the object,
• an illuminance measurement apparatus, including a chassis having a detection surface formed with an aperture through which said exposure light enters, a light receiving device having a light receiving surface provided at a position corresponding to the aperture in said chassis, and a reflection surface for reflecting said detection light provided on said chassis, and mounted on said stage, and
• a control device which controls said stage so that said detection surface becomes in register with a predetermined reference based on the result of detection of said detection device when irradiating said detection light to said reflection surface.

An exposure method for transferring a pattern of a mask on to a substrate by exposure light, said exposure method comprising the steps of

• mounting an illuminance measurement apparatus including a chassis having a detection surface formed with an aperture through which said exposure light enters, a light receiving device having a light receiving surface provided at a position corresponding to the aperture in said chassis, and a reflection surface provided on said chassis on a stage for holding said substrate and adjusting at least one of a position and posture of said substrate,
• irradiating detection light toward said reflection surface and receiving the light reflected at the reflection surface to detect at least one of the position and posture of the reflection surface,
• controlling said stage so that said detection surface becomes in register with a predetermined reference based on the result of detection when irradiating said detection light to said reflection surface,
• irradiating said exposure light to said detection surface and measuring the illuminance of said exposure light, and
• adjusting the illuminance of said exposure light and exposing said substrate based on the results of measurement when irradiating said exposure light on said detection surface.