US 6,603,167 B2 · Capacitor with lower electrode located at the same level as an interconnect line

Abstract

A capacitor in which the lower electrode and an interconnect line are located at the same level. The capacitor includes a first conductive line and a second conductive line on a substrate located at the same level, wherein the second conductive line defines a capacitor region and is used as a lower electrode of the capacitor; an insulating layer on the substrate, the first conductive line, and the second conductive line; and a third conductive line on the insulating layer in the capacitor region such that the third conductive line is used as an upper electrode of the capacitor. Since the lower electrode and an interconnect line can be in-situ (concurrently) formed to be located at the same level, one mask can be omitted compared with the conventional method, and production costs can be reduced.

Claims15

Dependent claims

A capacitor, comprising:

a first conductive line and a second conductive line on a substrate located at the same level, wherein the second conductive line defines a capacitor region and is used as a lower electrode of the capacitor;
an insulating layer on the substrate, the first conductive line, and the second conductive line;
a third conductive line on the insulating layer in the capacitor region such that the third conductive line is used as an upper electrode of the capacitor;
a dielectric layer on the upper electrode and the insulating layer, wherein the dielectric layer has a first via hole reaching the first conductive line and a second via hole reaching the upper electrode;
a first metal plug filled in the first via hole;
and
a second metal plug filled in the second via hole.

4 more elements

Dependencies are inferred from the claim text.

Capacitor with lower electrode located at the same level as an interconnect line

Life of this patent

Capacitor with lower electrode located at the same level as an interconnect line

Life of this patent

Abstract

Claims15