Solution processing apparatus
AssigneeTokyo Electron Limited
InventorsYuji Matsuyama, Shuichi Nagamine
Life of this patent
Estimating the term…
Abstract
A developing processing apparatus for supplying a developing solution to a wafer on which a photoresist film has been formed to thereby perform developing processing includes a wafer holding portion for horizontally holding the wafer, a linear nozzle held above the wafer holding portion for supplying the developing solution onto the wafer while moving in a predetermined horizontal direction, and a resistance bar for imparting discharge resistance to the developing solution discharged from the linear nozzle. This allows all discharge ports to discharge the developing solution uniformly, especially even when discharge pressure for the developing solution to be supplied is low in development of a scan method using a linear nozzle or a slit nozzle.
Claims9
A solution processing apparatus for supplying a developing solution to a substrate in a stationary state to thereby perform predetermined processing, comprising:
- a substrate holding mechanism configured to horizontally hold the substrate;
- a solution supply mechanism configured to supply the developing solution;
- a linear nozzle including a solution inlet port which communicates with the solution supply mechanism, and a solution discharge port having a dimension corresponding to that of the substrate;
- a nozzle moving mechanism configured to scan-move the linear nozzle between a home position and a use position such that the linear nozzle moves along the substrate held on the substrate holding mechanism, said home position being away from the substrate holding mechanism, and said use position being right above the substrate holding mechanism;
- a plate or a rod member for providing resistance for a developing solution discharged from the linear nozzle, thereby causing the developing solution to be discharged with a reduced pressure, said plate or rod member being located at a solution discharge start position horizontally away from the substrate holding mechanism and between the home position and the use position, the plate or rod member being located close to an under face of the linear nozzle, and having a width slightly greater than the dimension of the solution discharge port;
- and
- a control portion which controls the solution supply mechanism and the nozzle moving mechanism such that the linear nozzle located right above the plate or rod member is scan-moved to the use position when the linear nozzle starts discharging the developing solution.
A solution processing apparatus for supplying a developing solution to a substrate to thereby perform predetermined processing, comprising:
- a substrate holding mechanism configured to horizontally hold the substrate;
- a solution supply mechanism configured to supply the developing solution;
- a linear nozzle including a solution inlet port which communicates with the solution supply mechanism, and a solution discharge port having a dimension corresponding to that of the substrate, said linear nozzle further including a buffer chamber communicating with the solution inlet port and the solution discharge port, and guide grooves formed in an inner wall of the buffer chamber, the guide grooves guiding the developing solution to the solution discharge port;
- a nozzle moving mechanism configured to scan-move the linear nozzle between a home position and a use position such that the linear nozzle moves along the substrate held on the substrate holding mechanism, said home position being away from the substrate holding mechanism, and said use position being right above the substrate holding mechanism;
- discharge resistance providing means, located in the buffer chamber, for providing resistance for a developing solution discharged from the linear nozzle, thereby causing the developing solution to be discharged with a reduced pressure;
- and
- a control portion which controls the solution supply mechanism and the nozzle moving mechanism such that the developing solution is discharged from the linear nozzle before the linear nozzle reaches the use position in a scan-move mode in which the linear nozzle is scan-moved from the home position toward the use position.
Dependencies are inferred from the claim text.