Automated photomask inspection apparatus
AssigneeKLA-Tencor Corporation
InventorsMark Joseph Wihl, Tao-Yi Fu, Marek Zywno, Damon Floyd Kvamme, Michael E. Fein
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AssigneeKLA-Tencor Corporation
InventorsMark Joseph Wihl, Tao-Yi Fu, Marek Zywno, Damon Floyd Kvamme, Michael E. Fein
Estimating the term…
An automated photomask inspection apparatus including an XY state (12) for transporting a substrate (14) under test in a serpentine path in an XY plane, an optical system (16) comprising a laser (30), a transmission light detector (34), a reflected light detector (36), optical elements defining reference beam paths and illuminating beam paths between the laser, the substrate and the detectors and an acousto-optical beam scanner (40, 42) for reciprocatingly scanning the illuminating and reference beams relative to the substrate surface, and an electronic control, analysis and display system for controlling the operation of the stage and optical system and for interpreting and storing the signals output by the detectors. The apparatus can operate in a die-to-die comparison mode or a die-to-database mode.
An optical inspection system, comprising:
Dependencies are inferred from the claim text.