X-ray projection exposure apparatus and a device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorsShinichi Hara, Masami Tsukamoto
Life of this patent
Estimating the term…
Abstract
An X-ray exposure apparatus operating in a vacuum or a reduced-pressure environment includes a mask, arranged in the vacuum or in the reduced-pressure environment, for holding a reflection X-ray mask having a mask pattern thereon, an X-ray illuminating system arranged so as to illuminate the reflection X-ray mask having the mask pattern thereon, relatively scanningly with X-rays, wherein the mask pattern being illuminated is transferred onto an object, and a cooling structure for cooling the X-ray mask held by the mask chuck.
Claims8
An X-ray exposure apparatus, comprising:
- a mask chuck, arranged in a vacuum or in a reduced-pressure environment, for holding a reflection mask having a mask pattern thereon;
- an illuminating system for illuminating the reflection mask with X-rays, from a radiation source;
- a cooling structure for cooling the reflection mask held by said mask chuck;
- and
- a driving control unit for driving said mask chuck relative to X-rays from said illuminating system,
- wherein the reflection mask held by said mask chuck is scanningly illuminated with X-rays from said illuminating system, and the mask pattern is scanningly transferred onto an object.
A device manufacturing method, comprising the steps of:
- exposing an object to a mask pattern formed on a reflection mask by using an X-ray exposure apparatus, the X-ray exposure apparatus having,
- (i) a mask chuck, arranged in a vacuum or in a reduced-pressure environment, for holding the reflection mask,
- (ii) an illuminating system for illuminating the reflection mask with X-rays from a radiation source,
- (iii) a cooling structure for cooling the reflection mask held by the mask chuck;
- and
- (iv) a driving control unit for driving the mask chuck relative to X-rays from the illuminating system,
- wherein the reflection mask held by the mask chuck is scanningly illuminated with X-rays from the illuminating system, and the mask pattern is scanningly transferred onto the object;
- developing the object to produce a circuit pattern.
Dependencies are inferred from the claim text.