Electrostatically attracting electrode and a method of manufacture thereof

An electrostatic chuck for holding a substrate comprising:

• a first electrode having a top surface with a first level and a recess made therein, the first electrode being formed on an insulating member;
• a second electrode provided in the recess of the first electrode and having a top surface with a same level as the first level of the top surface of the first electrode;
• an electrostatic attraction layer formed over the top surfaces of the first electrode and the second electrode which is provided in the first electrode;
• and
• an insulating layer formed between the first electrode and the second electrode, the insulating layer being formed of a material having a higher resistivity than a resistivity of the electrostatic attraction layer;
• wherein voltage is applied to the first electrode and the second electrode to electrostatically attract the substrate.

A method of manufacturing an electrostatic chuck for holding a substrate comprising the steps of:

• providing a first electrode having a top surface with a first level and forming a recess therein, the first electrode being formed on an insulating member;
• forming an insulating layer in the recess of the first electrode;
• providing a second electrode having a top surface and disposing the second electrode in the recess of the first electrode, wherein the top surface of the second electrode has the same level as the first level of the top surface of the first electrode;
• and
• forming an electrostatic attraction layer over the top surfaces of the first electrode and the second electrode;
• wherein the insulating layer formed in the recess of the first electrode is made of a material which has a higher resistivity than a resistivity of the electrostatic attraction layer.