Back to results
US 6,583,881 B2Granted
Lithography using quantum entangled particles
AssigneeCalifornia Institute of Technology
InventorsColin Williams, Jonathan Dowling
Life of this patent
Estimating the term…
Abstract
A system of etching using quantum entangled particles to get shorter interference fringes. An interferometer is used to obtain an interference fringe. N entangled photons are input to the interferometer. This reduces the distance between interference fringes by n, where again n is the number of entangled photons.
Claims2
A method of reducing a size of etchable features, comprising:
- forming a first feature using lithography, that can have a first minimum size;
- and
- using entangled photons to reduce said first minimum size to a second minimum size without changing the characteristics of the illuminating radiation.
Dependencies are inferred from the claim text.