Substrate holder for lithographic apparatus
AssigneeASML Netherlands B.V.
InventorsFrank van Schaik, Gerardus J. J. Keijsers
Life of this patent
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AssigneeASML Netherlands B.V.
InventorsFrank van Schaik, Gerardus J. J. Keijsers
Estimating the term…
An intermediate substrate holder for use in a lithographic projection apparatus, which holder can itself be held by a standard substrate holder in the lithographic projection apparatus and in turn can hold a non-standard substrate. The intermediate substrate holder includes at least one of a vacuum holder and a mechanical clamp. The vacuum holder includes a vacuum space on which the non-standard substrate is placed; a barrier around the edge of the vacuum space that closes off the vacuum space and that makes a sealing contact with the non-standard substrate; and a vacuum generator. The mechanical clamp may include two or more stationary positioning pins opposed by a slidable mechanism which is provided with at least one sliding positioning pin mounted thereon and which is biased to move the sliding positioning pin towards the stationary pins.
A lithographic projection apparatus comprising:
A device manufacturing method comprising:
An intermediate substrate holder comprising:
Dependencies are inferred from the claim text.