Exposure apparatus and its making method, and device manufacturing method

A making method of an exposure apparatus which exposes a substrate by an energy beam, said making method including:

• providing a laser unit which includes a light source portion having a wavelength monitoring portion and a reference wavelength light source, and emits said energy beam;
• providing an illumination optical system which illuminates a mask on which a pattern is formed with said energy beam from said laser unit;
• providing a main body of said exposure apparatus which transfers said pattern onto said substrate, said main body including a projection optical system which projects said energy beam outgoing from said mask onto said substrate;
• and
• providing an environment control chamber which includes said wavelength monitoring portion and said reference wavelength light source, and houses said main body of said exposure apparatus and at least a part of said light source portion.

An exposure apparatus which exposes a substrate with an energy beam irradiated on a mask, sa d exposure apparatus comprising:

• a laser unit which includes a calibration unit of a wavelength of said energy beam, and emits said energy beam, said calibration unit having a wavelength monitoring portion and a reference wavelength light source;
• a main body of said exposure apparatus which includes an optical system which said energy beam passes through, and exposes said substrate with said energy beam;
• and
• an environment control unit which maintains an environment where a part of said laser unit including said wavelength monitoring portion and reference wavelength light source of said calibration unit is arranged to be substantially the same as said optical system.