Radiation tolerant back biased CMOS VLSI
AssigneeScience & Technology Corporation @ UNM
InventorsGary K. Maki, Jody W. Gambles, Kenneth J. Hass
Life of this patent
Estimating the term…
Loading patent…
AssigneeScience & Technology Corporation @ UNM
InventorsGary K. Maki, Jody W. Gambles, Kenneth J. Hass
Estimating the term…
A CMOS circuit formed in a semiconductor substrate having improved immunity to total ionizing dose radiation, improved immunity to radiation induced latch up, and improved immunity to a single event upset. The architecture of the present invention can be utilized with the n-well, p-well, or dual-well processes. For example, a preferred embodiment of the present invention is described relative to a p-well process wherein the p-well is formed in an n-type substrate. A network of NMOS transistors is formed in the p-well, and a network of PMOS transistors is formed in the n-type substrate. A contact is electrically coupled to the p-well region and is coupled to first means for independently controlling the voltage in the p-well region. Another contact is electrically coupled to the n-type substrate and is coupled to second means for independently controlling the voltage in the n-type substrate. By controlling the p-well voltage, the effective threshold voltages of the n-channel transistors both drawn and parasitic can be dynamically tuned. Likewise, by controlling the n-type substrate, the effective threshold voltages of the p-channel transistors both drawn and parasitic can also be dynamically tuned. Preferably, by optimizing the threshold voltages of the n-channel and p-channel transistors, the total ionizing dose radiation effect will be neutralized and lower supply voltages can be utilized for the circuit which would result in the circuit requiring less power.
A CMOS circuit formed in a semiconductor substrate having a circuit bearing surface, the circuit includes a Vdd power supply and a ground, the circuit having improved immunity from effects of total dose radiation and comprising:
A CMOS circuit formed in a semiconductor substrate having a circuit bearing surface with a p-type region and an n-type region, the circuit includes a Vdd power supply and a Vss power supply, the circuit having improved immunity from effects of total dose radiation and comprising:
A CMOS circuit formed in a semiconductor substrate having a circuit bearing surface with a p-type region and an n-type region, the circuit includes a Vdd power supply and a Vss power supply, the circuit having improved immunity from effect of total dose radiation and comprising:
A CMOS circuit formed in a semiconductor substrate having a circuit bearing surface with a p-type region and an n-type region, the circuit includes a Vdd power supply and a Vss power supply, the circuit having improved immunity from effects of total dose radiation and comprising:
A CMOS circuit formed in a semiconductor substrate having a circuit bearing surface with a p-type region and an n-type region, the circuit includes a Vdd power supply and a Vss power supply, the circuit having improved immunity from effects of total dose radiation and comprising:
A CMOS circuit formed in a semiconductor substrate having a circuit bearing surface with a p-type region and an n-type region, the circuit includes a Vdd power supply and a Vss power supply, the circuit having improved immunity from effects of total dose radiation and comprising:
Dependencies are inferred from the claim text.