Sandblasting agent, wafer treated with the same, and method of treatment with the same
AssigneeShin-Etsu Handotai Co., Ltd.
InventorsToshiaki Otaka, Teruaki Fukami
Life of this patent
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Abstract
A silicon wafer is sand blasted using a sand blasting abrasive material containing a chelating agent which is selected from the group consisting of, for example, the following compounds (1) to (4) and salts thereof: (1) Nitrilotriacetic acid (NTA) (2) Ethylenediaminetetraacetic acid (EDTA) (3) Diethylenediamine-N,N,N″,N″-pentaacetic acid (DTPA) (4) Cyclohexanediaminetetraacetic acid (CyDTA).
Claims23
A sand blasting abrasive material composed of natural quartz powder as a major component and containing a chelating agent, wherein the chelating agent is selected from the group consisting of:
- (1) Nitrilotriacetic acid (NTA), or a salt thereof,
- (2) Ethylenediaminetetraacetic acid (EDTA), or a salt thereof,
- (3) Diethylenediamine-N,N,N″,N″-pentaacetic acid (DTPA), or a salt thereof,
- (4) Cyclohexanediaminetetraacetic acid (CyDTA), or a salt thereof, and
- (5) any combination of (1), (2), (3), and (4).
A sand blasting abrasive material composed of natural quartz powder as a major component and containing a chelating agent, wherein a molar concentration of the chelating agent is 4.28×10−4 mol/l or more.
A sand blasting abrasive material composed of natural quartz powder as a major component and containing a chelating agent, wherein a molar concentration of the chelating agent is 2.57×10−3 mol/l or more.
A sand blasting abrasive material composed of natural quartz powder as a major component and containing a chelating agent, being a slurry prepared by adding natural quartz powder into water.
A sand blasting method for a wafer comprising the step of sand blasting with a sand blasting abrasive material composed of natural quartz powder as a major component and containing a chelating agent.
An abrasive slurry for sand blasting comprising water, natural quartz powder having trace amounts of metal ions included therein and a chelating agent which forms a complex with the metal ions.
Dependencies are inferred from the claim text.