Method of producing shaped bodies of semiconductor materials
AssigneeG.T. Equipment Technologies, Inc.
InventorsMohan Chandra, Yuepeng Wan
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Abstract
A method for producing formed semiconductor articles with predefined shapes such as core tubes for CVD production of bulk polysilicon. The method is characterized by thermal spray deposition of the semiconductor material in a on a temperature controlled rotating mandrel that is shaped complementarily to the desired article shape, and by later separation of the formed semiconductor body from the mandrel by thermal contraction, melting, or chemical reduction of the mandrel size.
Claims18
A method for manufacturing a thin wall tube of silicon comprising the steps of:
- fabricating a mandrel with a forming surface conforming to a cylinder shape,
- keeping said forming surface in continuous motion with respect to a thermal spray apparatus,
- supplying said thermal spray apparatus with a powdered form of said silicon,
- depositing with said thermal spray apparatus a continuous layer of said powered form of said silicon on said forming surface whereby the continuous layer is maintained at not more than about 400° C. until said thin wall tube is complete, and
- separating said thin wall tube from said mandrel.
A method for manufacturing a polysilicon tube comprising the steps of:
- fabricating a mandrel with a tubular forming surface,
- rotating said mandrel with respect to a thermal spray apparatus,
- supplying a powdered form of silicon to said thermal spray apparatus,
- depositing on said tubular forming surface with said thermal spray apparatus a continuous layer of silicon whereby the continuous layer is maintained at not more than about 400° C. until said polysilicon tube is complete, and
- separating said polysilicon tube from said mandrel.
Dependencies are inferred from the claim text.