Projection optical system, projection exposure apparatus, and projection exposure method

A dioptric projection optical system which projects an image of a first surface onto a second surface, comprising:

• a first lens group having a negative refractive power and arranged in an optical path between the first surface and the second surface,
• a second lens group having a positive refractive power and arranged in an optical path between the first lens group and the second surface,
• a third lens group having a negative refractive power and arranged in an optical path between the second lens group and the second surface,
• a fourth lens group having an aperture stop and arranged in an optical path between the third lens group and the second surface, and
• a fifth lens group having a positive refractive power and arranged in an optical path between the fourth lens group and the second surface,
• wherein an clear aperture of a light beam in the projection optical system monotonically increases within the first lens group in a direction from the first surface side to the second surface side, goes from an increased size to a decreased size within the second lens group, goes from a decreased size to an increased size within the third lens group, and monotonically decreases within the fifth lens group, and
• when the clear aperture of a surface having a maximum clear aperture of the second lens group is Mx2 and the clear aperture of a surface having a minimum clear aperture within the third lens group is Mn3, the following condition is satisfied:
• 1.7<Mx2/Mn3<4.