Inspection system for the pupil of a lithographic tool
AssigneeAdvanced Micro Devices, Inc.
InventorsBruno M. La Fontaine, Harry J. Levinson, Jongwook Kye
Life of this patent
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Abstract
An inspection tool or inspection system can be utilized to determine whether the appropriate pattern is on a reticle. The reticle can be associated with EUV lithographic tools. The system utilizes an at least two wavelengths of light. The light is directed to the reticle at the at least two wavelengths of light.
Claims20
A method of inspecting a lens assembly utilized in a lithographic stepper, the method comprising:
- providing radiation at a first coherence through a reticle or mask to a photoresist material;
- providing radiation at a second coherence through the mask or reticle to the photoresist material;
- developing the photoresist material;
- and
- observing the photoresist material for an error associated with the lens assembly.
A method of inspecting a pupil associated with manufacture of an integrated circuit, the method comprising:
- providing a pattern of low coherence radiation via a reticle or mask to photoresist material;
- providing a pattern of high coherence radiation to via a reticle or mask photoresist material;
- developing the photoresist material;
- and
- observing the photoresist material to determine a presence of a lens aberration error.
An inspection system for an optical system for use in an integrated circuit fabrication system, the inspection system comprising:
- means for providing radiation at first coherence via a reticle or mask to a photoresist material;
- means for providing radiation at a second coherence via a reticle or mask to the photoresist material;
- means for developing the photoresist material;
- and
- means for observing the photoresist material for an error associated with the optical system.
Dependencies are inferred from the claim text.