Pupil filtering for a lithographic tool
OwnerJongwook Kye, Bruno M. La Fontaineinventors
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Abstract
A mask or reticle is optimized for use in a lithographic system. The mask or reticle includes a substrate and a pupil filter pattern. The substrate includes an IC pattern representing at least one integrated circuit feature. The pupil filter pattern can enhance the resolution associated with the lithographic system.
Claims20
A mask or reticle for use in a lithographic system, the mask or reticle comprising:
- a substrate including an integrated circuit (IC) pattern representing at least one integrated circuit feature and a pupil filter pattern.
A method of enhancing resolution of a lithographic system, the lithographic system including a pupil, the method comprising:
- providing a mask or reticle having an integrated circuit (IC) pattern;
- and
- providing a pupil filter pattern on the mask or reticle.
A lithographic system for use in integrated circuit fabrication, the lithographic system including lens assemblies represented by a pupil, the lithographic system comprising:
- a mask means for patterning radiation according to an integrated circuit pattern;
- and
- a pupil filter means for patterning radiation in accordance with a Fourier transform of a hypothetical pupil filter located at a pupil plane.
Dependencies are inferred from the claim text.