Method for designing reticle, reticle, and method for manufacturing semiconductor device

A method of manufacturing a semiconductor device comprising:

• exposing a photo sensitive film formed on a conductive film through a medium of a reticle designed by
• generating main patterns and first dummy patterns separated with intervals from the main patterns,
• dividing each of said first dummy patterns into a plurality of spaced apart second dummy patterns,
• measuring each of said second dummy patterns to find third dummy patterns having respective widths and areas below respective smallest allowable values, and
• connecting respectively each third dummy pattern which is adjacent to a second dummy pattern with the adjacent second dummy pattern by generating a connecting dummy pattern;
• developing the exposed photosensitive film thereby to form an etchant-resistant mask in conformity with said main patterns and said dummy patterns;
• and
• removing by etching said conductive film with said etchant-resistant mask thereby to form an interconnection layer and a dummy layer.