Apparatus and methods for development of resist patterns

An integrated apparatus for processing a resist pattern imaged on a substrate, the apparatus comprising a preheat oven having an entrance and an exit which define a pathway along which the imaged substrate progresses and a chemical development section which is downstream of the preheat oven and which effects the chemical development of the imaged substrate, wherein the entrance to the preheat oven comprises a barrier for hindering or preventing the flow of air through the entrance, and the exit from the preheat oven comprises a barrier for hindering or preventing the flow of air through the exit, the apparatus further comprising a controllable mechanical barrier between heat-emitting parts of the preheat oven and the imaged substrate progressing through the preheat oven, the mechanical barrier being selectively operable to control the amount of heat applied to the imaged substrate as it progresses through the preheat oven, the mechanical barrier comprising an array of louvers between heat-emitting parts of the preheat oven and the imaged substrate progressing through the preheat oven, wherein the array of louvers are able to be turned between positions in which the louvers are arranged generally transversely to the imaged substrate progressing through the preheat oven, such that heat may pass between the louvers, and positions parallel to the image substrate in which the louvers together constitute a shutter controlling the delivery of heat to the imaged substrate.

A method of developing a thermal lithographic printing plate which has been imaged, the method comprising:

• (a) providing an integrated apparatus for processing a resist pattern imaged on a substrate, the apparatus comprising a preheat oven having an entrance and an exit which define a pathway along which the imaged substrate progresses and a chemical development section which is downstream of the preheat oven and which effects the chemical development of the imaged substrate, wherein the preheat oven is capable of actively controlling the amount of heat applied to the imaged substrate as the substrate progresses through the preheat oven so as to heat the imaged substrate evenly, the apparatus further comprising a controllable mechanical barrier between heat-emitting parts of the preheat oven and the imaged substrate progressing through the preheat oven, the mechanical barrier being selectively operable to control the amount of heat applied to the imaged substrate as it progresses through the preheat oven, the mechanical barrier comprising an array of louvers between heat-emitting parts of the preheat oven and the imaged substrate progressing through the preheat oven, wherein the array of louvers are able to be turned between positions in which the louvers are arranged generally transversely to the imaged substrate progressing through the preheat oven, such that heat may pass between the louvers, and positions parallel to the imaged substrate in which the louvers together constitute a shutter controlling the delivery of heat to the imaged substrate;
• and (b) conveying the thermal lithographic printing plate through the apparatus.

An integrated apparatus for processing a resist pattern imaged on a substrate, the apparatus comprising a preheat oven having an entrance and an exit which define a pathway along which the imaged substrate progresses and a chemical development section which is downstream of the preheat oven and which effects the chemical development of the imaged substrate, wherein the entrance to and exit from the preheat oven each comprise a barrier comprising a displaceable elastomeric flap for hindering or preventing the flow of air through the entrance and exit respectively, the preheat oven section comprises heater matrices arranged respectively above and below the imaged substrate to deliver heat transversely to the imaged substrate progressing through the preheat oven, the preheat oven is capable of actively controlling the amount of heat applied to the imaged substrate as the substrate progresses through the preheat oven so as to heat the imaged substrate evenly, and the apparatus further comprises a controllable mechanical barrier between heat-emitting parts of the preheat oven and the imaged substrate progressing through the preheat oven, the mechanical barrier being selectively operable to control the amount of heat applied to the imaged substrate as it progresses through the preheat oven, and the mechanical barrier comprises an array of titanium louvers able to be turned between positions in which they are arranged generally transversely to the imaged substrate progressing through the preheat oven, such that heat may pass between the louvers, and positions in which the louvers together constitute a shutter controlling the delivery of heat to the imaged substrate.