Lithographic data verification method and photo mask manufacturing method
AssigneeSony Corporation
InventorRyuji Takenouchi
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AssigneeSony Corporation
InventorRyuji Takenouchi
Estimating the term…
To reduce the time for verification in lithographic data and reduce the turn-around-time in preparation of lithographic data, a first lithographic input data and a second lithographic input data are compared in their data formats to extract data of the first lithographic input data excluding data common to the second lithographic input data as a first difference data, or to extract data of the second lithographic input data excluding data common to the first lithographic input data as a second difference data. If the first difference data and the second difference data contain data, they are compared graphically to extract different data as a third difference data. If the third difference data contains data, the first lithographic input data and the second lithographic input data are acknowledged to have a difference therebetween.
A method for verifying lithographic data for a lithographic device, characterized in:
A method for verifying data for a lithographic device, characterized in:
A method for manufacturing a photo mask, which makes a photo mask on the basis of lithographic data for a lithographic device, comprising:
A method for manufacturing a photo mask, which makes a photo mask on the basis of lithographic data for a lithographic device, comprising:
Dependencies are inferred from the claim text.