Process for preparing tantalum alkoxides and niobium alkoxides
AssigneeH.C. Starck GmbH
InventorFriedrich Zell
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Abstract
The invention relates to a process for preparing niobium(V) alkoxides and tantalum(V) alkoxides, in particular niobium(V) ethoxide and tantalum(V) ethoxide, by reacting NbCl5 or TaCl5 with an appropriate alcohol in the presence of ammonia, wherein NbCl5 or TaCl5 is dissolved at a temperature of from about 0° C. to −50° C. in the alcohol containing from about 5 to about 7 mol of ammonia per mol of NbCl5 or TaCl5 to be reacted.
Claims13
A process for preparing a niobium(V) alkoxide or a tantalum(V) alkoxide of the formula (I)
- M(OR)5 (I),
- wherein
- M represents Nb or Ta and
- R represents C1-C5-alkyl;
- the process comprising
- dissolving NbCl5 or TaCl5 in an alcohol of the formula (II)
- ROH (II),
- wherein R represents C1-C5-alkyl, at a temperature ranging from about 0° C. to about −50° C. under an inert atmosphere, and wherein the alcohol contains from about 5 to about 7 mol of ammonia per mol of NbCl5 or TaCl5, reacting NbCl5 or TaCl5 with alcohol of the formula (II), and thereby forming the niobium(V) alkoxide or the tantalum(V) alkoxide of the formula (I).
A process comprising subjecting a niobium(V) alkoxide or a tantalum(V) alkoxide of the formula (I) M(OR)5(I), wherein M represents Nb or Ta and R represents C1-C5-alkyl;
- to a chemical vapor deposition process;
- wherein the niobium(V) alkoxide or a tantalum(V) alkoxide of the formula (I) has been prepared by dissolving NbCl5 or TaCl5 in an alcohol of the formula (II)
- ROH (II),
- wherein R represents C1-C5-alkyl, at a temperature ranging from about 0° C. to about −50° C., under an inert atmosphere, wherein the alcohol contains from about 5 to about 7 mol of ammonia per mol of NbCl5 or TaCl5, reacting NbCl5 or TaCl5 with alcohol of the formula (II), and thereby forming the niobium(V) alkoxide or the tantalum(V) alkoxide of the formula (I).
A process comprising depositioning, a niobium(V) alkoxide or a tantalum(V) alkoxide of the formula (I) M(OR)5(I), wherein M represents Nb or Ta and R represents C1-C5-alkyl;
- to a substrate;
- wherein the niobium(V) alkoxide or a tantalum(V) alkoxide of the formula (I) has been prepared by dissolving NbCl5 or TaCl5 in an alcohol of the formula (II)
- ROH (II),
- wherein R represents C1-C5-alkyl, at a temperature ranging from about 0° C. to about −50° C., under an inert atmosphere, wherein the alcohol contains from about 5 to about 7 mol of ammonia per mol of NbCl5 or TaCl5, reacting NbCl5 or TaCl5 with alcohol of the formula (II), and thereby forming the niobium(V) alkoxide or the tantalum(V) alkoxide of the formula (I).
A process comprising depositioning a niobium(V) alkoxide or a tantalum(V) alkoxide of the formula (I)
- M(OR)5 (I),
- wherein M represents Nb or Ta and R represents C1-C5-alkyl;
- to a substrate and forming a film selected from the group consisting of niobium oxide films, tantalum oxide films, niobium nitride films from a solution,
- wherein the niobium(V) alkoxide or a tantalum(V) alkoxide of the formula (I) has been prepared by dissolving NbCl5 or TaCl5 in an alcohol of the formula (II)
- ROH (II),
- wherein R represents C1-C5-alkyl, at a temperature ranging from about 0° C. to about −50° C., under an inert atmosphere, wherein the alcohol contains from about 5 to about 7 mol of ammonia per mol of NbCl5 or TaCl5, reacting NbCl5 or TaCl5 with alcohol of the formula (II), and thereby forming the niobium(V) alkoxide or the tantalum(V) alkoxide of the formula (I).
Dependencies are inferred from the claim text.