Metal compound solution and thin film formation using the same
AssigneeAsahi Denka Kogyo Kabushiki Kaisha
InventorsKazuhisa Onozawa, Naoki Yamada
Life of this patent
Estimating the term…
Abstract
A metal compound solution of a metal compound represented by formula (I): wherein R1, R2, and R3 are each a halogen-substituted or unsubstituted alkyl group having 1 to 8 carbon atoms which may contain an oxygen atom in its carbon chain; R4 is a straight-chain or branched alkylene group having 2 to 18 carbon atoms; M is lead, titanium or zirconium: when M is lead, l, m and n represent 0, 2 and 0, respectively; when M is titanium or zirconium, n represents 0 or 1, and l and m each represent an integer of 0 to 4 satisfying equation: 1+m+2n=4, in a cyclohexane compound represented by formula (II): wherein R5 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; and p represents 1 or 2.
Claims5
A metal compound solution comprising a metal compound represented by formula (I):
- wherein R1 and R2 each represent a halogen-substituted or unsubstituted alkyl group having 1 to 8 carbon atoms which may contain an oxygen atom in its carbon chain;
- M represents a lead atom;
- m represents 2,
- said metal compound being dissolved in a cyclohexane compound represented by formula (II):
- wherein R5 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms;
- p represents 1 or 2.
Dependencies are inferred from the claim text.