US 6,487,472 B1 · Semiconductor device manufacturing facility with a diagnosis system

Abstract

A facility for manufacturing semiconductor devices is provided with a diagnosis system for easily monitoring the operation states of various fabrication systems, and controlling them in case of abnormal operation states by means of a sensing signal from the fabrication systems and a control signal from a control system. The fabrication system outputs a sensing signal showing the operation states of the fabrication processes such as temperature, time, pressure, concentration, power, etc. The control system outputs a control signal to the fabrication systems for controlling their operation states via transmit lines connected thereto according to the sensing signal from the fabrication systems or an input signal from a host computer. The diagnosis system analyzes the sensing signal from the fabrication systems and the control signal from the control system so as to assess the operation states of the fabrication systems. The control system and the diagnosis system are connected to a LAN (Local Area Network) connected to a communication modem, and the fabrication systems are diagnosed via a communication network.

Claims26

Dependent claims

A facility for manufacturing semiconductor devices comprising:

a plurality of fabrication systems for carrying out fabrication processes for manufacturing semiconductor devices and outputting a sensing signal showing operation states of the fabrication processes;
a control system for outputting a control signal to the fabrication systems for controlling their operation states via transmit lines connected thereto according to the sensing signal from the fabrication systems or an input signal from a host computer;
and
a diagnosis system for analyzing the sensing signal from the fabrication systems and the control signal from the control system so as to assess the operation states of the fabrication systems.

1 more element

A fabrication facility for manufacturing semiconductor devices comprising:

an etch chamber for carrying out an etch process for manufacturing semiconductor devices;
a chamber control system for outputting a control signal for controlling the etch process and operation of the etch chamber according to a sensing signal from the etch chamber and an input signal from a host computer;
and
a diagnosis system for receiving a control signal, for controlling the etch process and an operation state of the etch chamber, and a sensing signal, for showing the etch process and the operation state of the etch chamber, diagnosing the etch process and the operation state of the etch chamber, and outputting a control signal to the etch chamber.

1 more element

A fabrication facility for manufacturing semiconductor devices comprising:

an exposure system for carrying out an exposure process for manufacturing semiconductor devices;
an exposure control system for outputting a control signal for controlling the exposure process and an operation of the exposure system according to a sensing signal from the exposure system and an input signal from a host computer;
and
a diagnosis system for receiving a control signal for controlling the exposure process and the operation state of the exposure system and a sensing signal for showing the exposure process and the operation state of the exposure system, diagnosing the exposure process and the operation state of the exposure system, and outputting a control signal to the exposure system according thereto.

1 more element

Dependencies are inferred from the claim text.

Semiconductor device manufacturing facility with a diagnosis system

Life of this patent

Semiconductor device manufacturing facility with a diagnosis system

Life of this patent

Abstract

Claims26